Masato Fujinaga

New phase-shifting mask structure for positive resist process

Nobuyuki Yoshioka, Hitoshi Nagata, Kazuya Kamon, 1991, Other Conferences.

3-D Topography and Impurity Integrated Process Simulator (3-D MIPS) and Its Applications

Satoru Kawazu, Katsumi Eikyu, Tadashi Nishimura, 1999 .

3-D numerical modeling of thermal flow for insulating thin film using surface diffusion

Yasumasa Tsukamoto, Tetsuya Uchida, Tatsuya Kunikiyo, 1995, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

Improvement of focus and exposure latitude by the use of phase-shifting masks for DUV applications

Nobuyuki Yoshioka, Maaike Op de Beeck, Tetsuro Hanawa, 1991, Other Conferences.

Reverse short-channel effect due to lateral diffusion of point-defect induced by source/drain ion implantation

Tetsuya Uchida, Tatsuya Kunikiyo, Norihiko Kotani, 1994, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

3-D topography simulator (3-D MULSS) based on a physical description of material topography

Masato Fujinaga, N. Kotani, N. Kotani, 1997 .

Photolithographic system using modified illumination

Kazuya Kamon, T. Miyamoto, Masato Fujinaga, 1992, 1992 Symposium on VLSI Technology Digest of Technical Papers.

Three dimensional topography simulation model using diffusion equation

Y. Akasaka, Norihiko Kotani, Masato Fujinaga, 1988, Technical Digest., International Electron Devices Meeting.

Stable Solution Method for Viscoelastic Oxidation Including Stress-Dependent Viscosity

Satoru Kawazu, Norihiko Kotani, Hirokazu Miyoshi, 1996 .

Three-dimensional topography simulation model: etching and lithography

Y. Akasaka, Tatsuya Kunikiyo, Norihiko Kotani, 1990 .