Shirou Nagaoka

Defectivity Performance of Full Field

Tetsuya Yamamoto, Katsushl Nakano, Iifan Malik, 2006 .

Practical implementation of immersion resist materials

Yasuhiro Iriuchijima, Tomoharu Fujiwara, Natsuko Sagawa, 2009, Advanced Lithography.

Process variation monitoring (PVM) by wafer inspection tool as a complementary method to CD-SEM for mapping LER and defect density on production wafers

Doron Meshulach, Shimon Levi, Kobi Kan, 2009, Advanced Lithography.