Hirokazu Aoyama

发表

A system for Learning Ecology with 3D graphics and Local Ma- terials Database

Satoru Fujii, Hirokazu Aoyama, Masaru Sot, 2006 .

The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

Hirokazu Aoyama, Takuji Ishikawa, Tetsuhiro Kodani, 2004, SPIE Advanced Lithography.

Novel fluorinated polymers for application in 193-nm lithography and 193-nm immersion lithography

Hirokazu Aoyama, Takashi Hayami, Takuji Ishikawa, 2006, SPIE Advanced Lithography.

MODELING OF SEAT-CHOICE BEHAVIOR IN WAITING SPACE OF HOSPITAL

Hirokazu Aoyama, Hiroyuki Kaneko, Toshihiro Osaragi, 2017 .

No. 1: Current status and issues of the Japan Patent Law system

Hirokazu Aoyama, 2003 .

No.8: Present condition of control over the infringement of intellectual property rights under the Unfair Competition Prevention Law

Hirokazu Aoyama, 2004 .

Novel main-chain-fluorinated polymers for 157-nm photoresists

Hirokazu Aoyama, Takuji Ishikawa, Meiten Koh, 2003, SPIE Advanced Lithography.

A process for the manufacture of 1,1,1,2,2,4,4,5,5,5, -decafluorpentan

Hirokazu Aoyama, Satoru Kohno, Satoshi Koyama, 1993 .

Essays for the 50th anniversary

Takanori Hayashi, Hirokazu Aoyama, Hideki Hasegawa, 2008 .

Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography

Hirokazu Aoyama, Toshiro Itani, Takuji Ishikawa, 2005, SPIE Advanced Lithography.

A process for preparing hexafluorocyclobuten and process for preparing hexafluorocyclobutan

Hirokazu Aoyama, Tatsuo Nakada, Akinori Yamamoto, 1994 .

Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers

Hirokazu Aoyama, Takuji Ishikawa, Meiten Koh, 2003, SPIE Advanced Lithography.

Synthesis of novel fluorinated norbornene derivatives for 157-nm application

Hirokazu Aoyama, Takuji Ishikawa, Meiten Koh, 2003, SPIE Advanced Lithography.

Development and Evaluation of a Ubiquitous Historical Tour Support System

Tadanori Mizuno, Satoru Fujii, Hirokazu Aoyama, 2007, KES.

Patent Law as "Information Law" : leagal protection and publication of "information"(1)

Hirokazu Aoyama, 1997 .

A process for preparing Pentafluordichlorpropanen.

Hirokazu Aoyama, Satoshi Koyama, Takashi Yasuhara, 1990 .

Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography

Hirokazu Aoyama, Takuji Ishikawa, Tetsuhiro Kodani, 2004, SPIE Advanced Lithography.

Novel low-reflective index fluoropolymers-based top anti-reflective coatings (TARC) for 193-nm lithography

Hirokazu Aoyama, Takashi Hayami, Takuji Ishikawa, 2007, SPIE Advanced Lithography.

On “The Basic Law on Intellectual Property”

Hirokazu Aoyama, 2003 .

Dry-etch resistance of fluorine functionalized polymers

Hirokazu Aoyama, Hiroyuki Watanabe, Takuji Ishikawa, 2002, SPIE Advanced Lithography.

Ownership and compensation of the research results Part 2

Hirokazu Aoyama, 2003 .

Tetrafluoroethylene-based Fluoropolymers for 157-nm Resist Materials

Hirokazu Aoyama, Minoru Toriumi, Toshiro Itani, 2003 .

Synthesis of Fluorinated Materials for 193-nm Immersion Lithography and 157-nm Lithography

Hirokazu Aoyama, Toshiro Itani, Takayuki Araki, 2005 .

Thermal Stability and Electrochemical Properties of Fluorine Compounds as Nonflammable Solvents for Lithium-Ion Batteries

Hirokazu Aoyama, Meiten Koh, Tsuyoshi Nakajima, 2010 .