Adam Lyons

Local area mask patterning of extreme ultraviolet lithography reticles for native defect analysis

Adam Lyons, 2013 .

Liftoff lithography of metals for extreme ultraviolet lithography mask absorber layer patterning

John G. Hartley, Ranganath Teki, Adam Lyons, 2012, Advanced Lithography.

Proximity effect correction parameters for patterning of EUV reticles with Gaussian electron beam lithography

John G. Hartley, Adam Lyons, 2012, Photomask Technology.

Bike Detection Today -- Technology Update

Adam Lyons, 2014 .

3D lithography modeling for ground rule development

Todd C. Bailey, Chandra Sarma, Dongbing Shao, 2011, Advanced Lithography.

Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations

Paul van Adrichem, Tom Wallow, Cyrus Tabery, 2021, Advanced Lithography.

Charging and error budgets in electron beam lithography tools

John G. Hartley, Adam Lyons, 2008 .