Guojing Zhang

发表

EUVL printing results of a low-thermal expansion material (LTEM) mask

Scott D. Hector, James R. Wasson, Cindy C. Larson, 2000, Advanced Lithography.

Understanding and reduction of defects on finished EUV masks

Guojing Zhang, Ted Liang, Peter Sanchez, 2005, SPIE Advanced Lithography.

EUVL alternating phase shift mask

Farhad Salmassi, Pei-Yang Yan, Guojing Zhang, 2011, Advanced Lithography.

EUV mask process development and integration

Yan Du, Pei-Yang Yan, Jeff Farnsworth, 2006, Photomask Japan.

TaN-based EUV mask absorber etch study

Ki-Ho Baik, Yan Du, Pei-Yang Yan, 2006, Photomask Japan.

Experimental study of mask line edge roughness transfer in DUV and EUV lithography patterning process

Pei-yang Yan, Guojing Zhang, 1999, Photomask Technology.

Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems

Bryan J. Rice, Michael Goldstein, Guojing Zhang, 2004, SPIE Advanced Lithography.

Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement

Eric M. Gullikson, Pei-Yang Yan, Guojing Zhang, 2015, Advanced Lithography.

EUVL dark-field exposure impact on CDs using thick and thin absorber masks

Guojing Zhang, Hiroyoshi Tanabe, Manish Chandhok, 2011, Advanced Lithography.

Progress in 193-nm top-surface imaging process development

David R. Wheeler, Guojing Zhang, John M. Hutchinson, 1998, Advanced Lithography.

Research on the Prediction of Solar Energy Generation based on Measured Environmental Data

Guojing Zhang, Xiaoying Wang, Zhihui Du, 2015 .

Implementing flare compensation for EUV masks through localized mask CD resizing

Bryan J. Rice, Sang Hun Lee, Michael Goldstein, 2003, SPIE Advanced Lithography.

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Eric Hendrickx, Gian F. Lorusso, Jan Hermans, 2009, Advanced Lithography.

Measurement of EUV absorber and resist CD using spectroscopic ellipsometer

Pei-yang Yan, Guojing Zhang, Malahat Tavassoli, 2013, Photomask Technology.

EUV mask absorber characterization and selection

Pei-Yang Yan, Guojing Zhang, Alan R. Stivers, 2000, Photomask Japan.

Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2002, SPIE Advanced Lithography.

One small step: world's first integrated EUVL process line

Bryan J. Rice, Guojing Zhang, Manish Chandhok, 2005, SPIE Advanced Lithography.

Static EUV micro-exposures using the ETS Set-2 optics

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 2003, SPIE Advanced Lithography.

EUVL multilayer mask blank defect mitigation for defect-free EUVL mask fabrication

Pei-Yang Yan, Yan Liu, Guojing Zhang, 2012, Advanced Lithography.

EUV mask patterning approaches

Pei-Yang Yan, Edita Tejnil, Patrick A. Kearney, 1999, Advanced Lithography.

Improvement of EUVL mask blank inspection capability at Intel

Guojing Zhang, Andy Ma, Ted Liang, 2009, Photomask Japan.

EUVL mask patterning with blanks from commercial suppliers

Frederick T. Chen, Pei-Yang Yan, Ping Qu, 2004, SPIE Photomask Technology.

EUV mask absorber defect size requirement at 100-nm design rules

Pei-Yang Yan, Patrick A. Kearney, Guojing Zhang, 1998, Advanced Lithography.

Enhanced optical inspectability of patterned EUVL mask

Pei-Yang Yan, Edita Tejnil, Guojing Zhang, 2002, SPIE Photomask Technology.

Demonstration of full-field patterning of 32 nm test chips using EUVL

James S. Clarke, Guojing Zhang, Manish Chandhok, 2009, Advanced Lithography.

Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 2003 .

Cr and TaN Absorber Mask Etch CD Performance Study For Extreme Ultraviolet Lithography

Pei-yang Yan, Guojing Zhang, 2002, Photomask Technology.

TaN EUVL mask fabrication and characterization

Pei-Yang Yan, Guojing Zhang, Andy Ma, 2001, SPIE Advanced Lithography.

Comparison of at-wavelenth inspection, printability, and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography (EUVL)

Pei-yang Yan, Jeffrey Bokor, Scott D. Hector, 1999, Photomask Technology.

EUV mask absorber defect repair with focused ion beam

Pei-Yang Yan, Patrick A. Kearney, Guojing Zhang, 1998, Photomask Technology.

Cr absorber mask for extreme-ultraviolet lithography

Pei-Yang Yan, Guojing Zhang, Ted Liang, 2001, SPIE Photomask Technology.

Liquid phase silylation process for 248-nm lithography using EL IR photoresist

Lynn Fuller, Bruce W. Smith, Guojing Zhang, 1994, Advanced Lithography.

Progress on EUV mask fabrication for 32-nm technology node and beyond

Pei-Yang Yan, Ping Qu, Guojing Zhang, 2007, Photomask Japan.

Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks

Sherry L. Baker, Patrick P. Naulleau, Farhad Salmassi, 2007 .

Exposing extreme ultraviolet lithography at Intel

Bryan J. Rice, Guojing Zhang, Manish Chandhok, 2006 .

System-level line-edge roughness limits in extreme ultraviolet lithography

Guojing Zhang, Dimitra Niakoula, Patrick P. Naulleau, 2008 .

EUV mask infrastructure and actinic pattern mask inspection

Guojing Zhang, Ted Liang, Eric Frendberg, 2020, Advanced Lithography.

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Kenneth A. Goldberg, Regina Soufli, Patrick P. Naulleau, 2002 .

Progress in extreme ultraviolet mask repair using a focused ion beam

Richard H. Livengood, Pei-Yang Yan, Guojing Zhang, 2000 .

Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks

Guojing Zhang, Ahmed Busnaina, Florence Eschbach, 2005 .

Nanoscale Particles Removal on an Extreme Ultra-Violet Lithography (EUVL) Mask Layer

Guojing Zhang, Ahmed Busnaina, Florence Eschbach, 2006 .

Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 2003 .

Extreme ultraviolet–embedded phase-shift mask

Farhad Salmassi, Eric M. Gullikson, Pei-Yang Yan, 2011 .