Daniel A. Tichenor

发表

Mass-producible microtags for security applications: Tolerance analysis by rigorous coupled-wave analysis

Richard H. Stulen, Avijit K. Ray-Chaudhuri, Kevin D. Krenz, 1997, Photonics West.

Recent results in the development of an integrated EUVL laboratory tool

Richard H. Stulen, R. W. Arling, John E. Bjorkholm, 1995, Advanced Lithography.

Development of a laboratory extreme-ultraviolet lithography tool

Richard H. Stulen, Weng W. Chow, Michael E. Malinowski, 1994, Advanced Lithography.

EUV engineering test stand

Kenneth A. Goldberg, Patrick P. Naulleau, Leonard E. Klebanoff, 2000, Advanced Lithography.

Application of laser plasma sources in soft x-ray projection lithography

Richard H. Stulen, Weng W. Chow, Michael E. Malinowski, 1994, Optics & Photonics.

Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool

Richard H. Stulen, Obert R. Wood, R. W. Arling, 1996, Advanced Lithography.

Resist performance in soft x-ray projection lithography

Weng W. Chow, William C. Sweatt, Daniel A. Tichenor, 1993, Advanced Lithography.

Lithographic characterization of improved projection optics in the EUVL engineering test stand

Patrick P. Naulleau, Henry N. Chapman, Sang Hun Lee, 2003, SPIE Advanced Lithography.

System and process learning in a full-field, high-power EUVL alpha tool

Kenneth A. Goldberg, Eric M. Gullikson, Patrick P. Naulleau, 2003, SPIE Advanced Lithography.

Sub-100-nm lithographic imaging with an EUV 10X microstepper

Kenneth A. Goldberg, Jonathan L. Cobb, Patrick P. Naulleau, 1999, Advanced Lithography.

Printability of substrate and absorber defects on extreme ultraviolet lithographic masks

Richard R. Freeman, Richard H. Stulen, David L. Windt, 1995, Advanced Lithography.

Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2002, SPIE Advanced Lithography.

Computer Analysis Of Holographic Interferograms For Nondestructive Testing

Daniel A. Tichenor, V. P. Madsen, 1979, Optics & Photonics.

Mass-producible micro-holographic tags

Richard H. Stulen, William C. Sweatt, Stanley H. Kravitz, 1996 .

Design criteria and recent developments of optical single particle counters for fossil fuel systems

Daniel A. Tichenor, James C. F. Wang, D. R. Hardesty, 1981 .

Performance upgrades in the EUV engineering test stand

Donald W. Sweeney, Kenneth A. Goldberg, Patrick P. Naulleau, 2002, SPIE Advanced Lithography.

Recent advances in the Sandia EUV 10x microstepper

Richard H. Stulen, Avijit K. Ray-Chaudhuri, Rodney P. Nissen, 1998, Advanced Lithography.

Lithographic evaluation of the EUV engineering test stand

Pei-yang Yan, Donald W. Sweeney, Kenneth A. Goldberg, 2002, SPIE Advanced Lithography.

Mass-producible microholographic tags

Richard H. Stulen, Stanley H. Kravitz, Mial E. Warren, 1996, Photonics West.

Fabrication, alignment, and test of an all-reflective soft x-ray microlithography objective

John E. Bjorkholm, Tanya E. Jewell, Daniel A. Tichenor, 1993, Optics & Photonics.

Extreme ultraviolet lithography for circuit fabrication at 0.1-μm feature size

Richard H. Stulen, Daniel A. Tichenor, Glenn D. Kubiak, 1995, Optics & Photonics.

Extreme UV resist technology: the limits of silylated resist resolution

Avijit K. Ray-Chaudhuri, Daniel A. Tichenor, Bruno LaFontaine, 1995, Advanced Lithography.

Initial results from the EUV engineering test stand

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2001, SPIE Optics + Photonics.

System integration and performance of the EUV engineering test stand

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2001, SPIE Advanced Lithography.

Wafer and reticle positioning system for the extreme ultraviolet lithography engineering test stand

Daniel A. Tichenor, John B. Wronosky, Tony G. Smith, 2000, Advanced Lithography.

Theoretical efficiency analysis of a condenser-embedded grating-based spectral purity filter for EUV lithography

Patrick P. Naulleau, William C. Sweatt, Daniel A. Tichenor, 2002 .

Precision optical aspheres for extreme ultraviolet lithography

Daniel A. Tichenor, Gary E. Sommargren, D. P. Gaines, 1996 .

Characterization of an expanded‐field Schwarzschild objective for extreme ultraviolet lithography

Richard H. Stulen, Michael E. Malinowski, David L. Windt, 1994 .

Coherent Transfer Function

Joseph W. Goodman, Daniel A. Tichenor, J. Goodman, 1972 .

Diffraction-limited soft x-ray projection lithography with a laser plasma source

Richard H. Stulen, Michael E. Malinowski, David L. Windt, 1991 .

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Kenneth A. Goldberg, Regina Soufli, Patrick P. Naulleau, 2002 .

Fabrication of metal–oxide–semiconductor devices with extreme ultraviolet lithography

Richard H. Stulen, Jeffrey Bokor, Donald M. Tennant, 1996 .

First lithographic results from the extreme ultraviolet Engineering Test Stand

Richard H. Stulen, Donald W. Sweeney, Kenneth A. Goldberg, 2001 .

Lithographic aerial-image contrast measurement in the extreme ultraviolet engineering test stand

Patrick P. Naulleau, Daniel A. Tichenor, Sang H. Lee, 2002 .

Computer Analysis Of Holographic Interferograms For Nondestructive Testing

Daniel A. Tichenor, V. P. Madsen, D. Tichenor, 1979 .