J. Maltabes

Mask repair technique assessment and development for the 45nm lithographic node

H. Marchman, D. Taylor, S. Hadisutjipto, 2006, Photomask Japan.

A study of imprint-specific defects in the step and flash imprint lithography process

J. Maltabes, K. Selinidis, S. V. Sreenivasan, 2007, SPIE Advanced Lithography.

Lithography in a 300 mm pilot production line

J. Maltabes, R. Schuster, D. Ganz, 1999, 1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314).

High resolution defect inspection of step and flash imprint lithography for 32 nm half-pitch patterning

J. Maltabes, K. Selinidis, I. McMackin, 2008, SPIE Advanced Lithography.