Stefan Decoster

Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist

Gian Francesco Lorusso, Vito Rutigliani, Vassilios Constantoudis, 2017, Advanced Lithography.

Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers

Peter De Bisschop, Christopher J. Wilson, Ming Mao, 2018, Advanced Lithography.

Self-aligned block technology: a step toward further scaling

Carlos Fonseca, Chris Wilson, Julien Ryckaert, 2017, Advanced Lithography.

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

Ming Mao, Eric Hendrickx, Friso Wittebrood, 2017, Advanced Lithography.