Daan Slotboom

Experimental verification of on-product overlay improvement by intra-lot overlay control using metrology based grouping

Paul Böcker, Sangjun Han, Honggoo Lee, 2017, Advanced Lithography.

Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography

Jan Mulkens, Hannah Wei, Michael Hanna, 2015, Advanced Lithography.

Overlay improvements using a real time machine learning algorithm

Jan Mulkens, Michael Kubis, Frank van de Mast, 2014, Advanced Lithography.

Holistic feedforward control for the 5 nm logic node and beyond

Jan Mulkens, Robert Socha, Stefan Keij, 2019, Advanced Lithography.

Solution for high-order distortion on extreme illumination condition using computational prediction method

Eric Janda, Jan Baselmans, Mariya Ponomarenko, 2015, Advanced Lithography.

Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

Kevin Ryan, Sung-Ki Park, Michael Kubis, 2015, Advanced Lithography.

Understanding advanced DRAM edge placement error budget and opportunities for control

Chan Hwang, Seung Yoon Lee, Jeongjin Lee, 2020, Advanced Lithography.