Tomoko Ojima

Feasibility of ultra-low k1 lithography for 28nm CMOS node

Soichi Inoue, Shoji Mimotogi, Hideaki Harakawa, 2009, Advanced Lithography.

Patterning performance of hyper NA immersion lithography for 32nm node logic process

Soichi Inoue, Shoji Mimotogi, Masafumi Asano, 2008, Lithography Asia.

Challenges for pattern formation with sub-100nm residual-layer thickness by roll-to-roll nanoimprint lithography

Ryoichi Inanami, Takuya Kono, Tetsuro Nakasugi, 2014, Advanced Lithography.

Sub-100 nm pattern formation by roll-to-roll nanoimprint

Ryoichi Inanami, Takuya Kono, Tetsuro Nakasugi, 2012, Advanced Lithography.

Novel prediction methodology for etched hole patterning failure

Hideaki Abe, Kohji Hashimoto, Shoji Mimotogi, 2012, Advanced Lithography.

Metrology and inspection required for next generation lithography

Hideaki Abe, Masafumi Asano, Akiko Kawamoto, 2017 .