Jonathan Cobb

Investigation of EUV tapeout flow issues, requirements, and options for volume manufacturing

Insung Kim, Kevin Lucas, Munhoe Do, 2011, Advanced Lithography.

Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations

Kevin Lucas, Chris Cork, Brian Ward, 2007, SPIE Advanced Lithography.

OPC to account for thick mask effect using simplified boundary layer model

Han-Ku Cho, Joo-Tae Moon, Sung-Woo Lee, 2006, SPIE Photomask Technology.

EUV modeling accuracy and integration requirements for the 16nm node

Eric Hendrickx, Gian F. Lorusso, Kevin Lucas, 2010, Advanced Lithography.

OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect

Jonathan Cobb, Young-Chang Kim, Sooryong Lee, 2007, SPIE Advanced Lithography.