Samir Bhamidipati

Automatic classification of patterned mask defects for requalification at wafer fabs in absence of layout data

Peter Buck, Sankaranarayanan Paninjath, Chin Kuei Chang, 2020, Photomask Technology.

Automatic classification and accurate size measurement of blank mask defects

Peter Buck, Sankaranarayanan Paninjath, Mark Pereira, 2015, Other Conferences.

Unsupervised machine learning based SEM image denoising for robust contour detection

Magdy Bayoumi, Germain Fenger, Sandip Halder, 2021, Photomask Technology.