Andreas Frommhold

发表

Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions

Gian Francesco Lorusso, Gijsbert Rispens, Vito Rutigliani, 2019, Advanced Lithography.

Predicting stochastic defects across the process window

Lieve Van Look, Gijsbert Rispens, Andreas Frommhold, 2019, Photomask Technology.

Organic hard masks utilizing fullerene derivatives

Andreas Frommhold, Tom Lada, Richard E. Palmer, 2015, Advanced Lithography.

Spin-on carbon using fullerene derivatives

Andreas Frommhold, Tom Lada, Richard E. Palmer, 2014, Advanced Lithography.

Optimization and sensitivity enhancement of high-resolution molecular resist for EUV lithography

Andreas Frommhold, Yasin Ekinci, John Roth, 2016, SPIE Advanced Lithography.

Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching

Andreas Frommhold, Richard E. Palmer, Alex P. G. Robinson, 2013, Advanced Lithography.

Spin-on-carbon hard masks utilising fullerene derivatives

Andreas Frommhold, Tom Lada, Alex P. G. Robinson, 2016, SPIE Advanced Lithography.

High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

Andreas Frommhold, Richard E. Palmer, Alex P. G. Robinson, 2012, Advanced Lithography.

Spiral peripheral nerve interface; updated fabrication process of the regenerative implant

Andreas Frommhold, Richard Barrett, Samia Benmerah, 2013, 2013 35th Annual International Conference of the IEEE Engineering in Medicine and Biology Society (EMBC).

Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography

Andreas Frommhold, Yasin Ekinci, Dongxu Yang, 2013 .

Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300

Lieve Van Look, Gijsbert Rispens, Andreas Frommhold, 2018, Photomask Technology.

Impact of EUV absorber variations on wafer patterning

Lawrence S. Melvin, Andreas Frommhold, Ulrich Welling, 2019, Advanced Lithography.

Towards 11nm half-pitch resolution for a negative-tone chemically amplified molecular resist platform for extreme-ultraviolet lithography

Andreas Frommhold, Yasin Ekinci, John Roth, 2015, Advanced Lithography.

Sensitivity enhancement of the high-resolution xMT multi-trigger resist for EUV lithography

Andreas Frommhold, Yasin Ekinci, John Roth, 2017, Advanced Lithography.

Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

Andreas Frommhold, Yasin Ekinci, Alex P. G. Robinson, 2016 .

Evaluation of local CD and placement distribution on EUV mask and its impact on wafer

Andreas Frommhold, Paul van Adrichem, Jan Mulkens, 2019, Photomask Japan.

Dynamic absorption coefficients of CAR and non-CAR resists at EUV

Andreas Frommhold, Yasin Ekinci, Roberto Fallica, 2016, SPIE Advanced Lithography.

Impact of local variability on defect-aware process windows

Andreas Frommhold, Guido Schiffelers, Eric Hendrickx, 2019, Advanced Lithography.

Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching

Andreas Frommhold, Richard E. Palmer, Alex P. G. Robinson, 2013 .

Enabling non-actinic EUV mask inspection using CNT pellicle

Andreas Frommhold, Emily Gallagher, Kevin Houchens, 2021, Advanced Lithography.

Massive e-beam metrology and inspection for analysis of EUV stochastic defect

Andreas Frommhold, Danilo De Simone, Kotaro Maruyama, 2021, Advanced Lithography.

Metal layer single EUV expose at pitch 28 nm: how bright field and NTD resist advantages align

Gijsbert Rispens, Andreas Frommhold, Eric Hendrickx, 2021, Advanced Lithography.

Pupil optimization for after etch defectivity: what imaging metrics matter?

Gijsbert Rispens, Andreas Frommhold, Kathleen Nafus, 2021, Photomask Technology.

Chapter 8 - Negative-tone organic molecular resists

Andreas Frommhold, Dongxu Yang, Richard A. Lawson, 2016 .

Performance of a high resolution chemically amplified electron beam resist at various beam energies

Andreas Frommhold, Edmund H. Linfield, Dongxu Yang, 2016 .

Fullerene-based spin-on-carbon hardmask

Andreas Frommhold, Richard E. Palmer, Alex P. G. Robinson, 2012 .