Christopher J. Progler

发表

Pupil illumination: in-situ measurement of partial coherence

Joseph P. Kirk, Christopher J. Progler, 1998, Advanced Lithography.

CPL mask technology for sub-100-nm contact hole imaging

Kevin D. Lucas, Christopher J. Progler, J. Fung Chen, 2004, Photomask Japan.

Application of Chromeless Phase Lithography (CPL) masks in ArF lithography

Will Conley, Christopher J. Progler, Robert J. Socha, 2002, Photomask Technology.

Effect of the partial coherence on reflective notching

Robert John Socha, Andrew R. Neureuther, Christopher J. Progler, 1997, Advanced Lithography.

Application of blazed gratings for determination of equivalent primary azimuthal aberrations

Joseph P. Kirk, Christopher J. Progler, 1999, Advanced Lithography.

Design rules for the fabrication of binary half-tone masks used for MEMS and photonic devices

Christopher J. Progler, Ernest Wayne Balch, Peter D. Rhyins, 2003, SPIE MOEMS-MEMS.

Application of deep-UV resist for 0.25-um metal and poly processing

William L. Krisa, Ken Brennan, Christopher J. Progler, 1996, Advanced Lithography.

Comparison of simulated and experimental CD-limited yield for a submicron i-line process

Chris A. Mack, Christopher J. Progler, Edward W. Charrier, 1995, Advanced Lithography.

CD control of low-k-factor step-and-scan lithography

Christopher P. Ausschnitt, Christopher J. Progler, William M. Chu, 2001, SPIE Advanced Lithography.

Simulation-enabled decision making in advanced lithographic manufacturing

Christopher J. Progler, 2001, Microelectronic and MEMS Technologies.

Process, design and optical proximity correction requirements for the 65nm device generation

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Design process optimization, virtual prototyping of manufacturing, and foundry-portable DFM (Invited Paper)

Christopher J. Progler, Victor V. Boksha, Mitchell D. Heins, 2005, SPIE Advanced Lithography.

Characterization of linewidth variation on 248- and 193-nm exposure tools

Lars W. Liebmann, Peter Talvi, Richard A. Ferguson, 2001, SPIE Advanced Lithography.

Impact of lithography variability on analog circuit behavior

Bhaskar Banerjee, Christopher J. Progler, M. F. Haniff, 2009, Advanced Lithography.

Zernike coefficients: are they really enough?

Christopher J. Progler, Alfred K. K. Wong, 2000, Advanced Lithography.

Impact of lithography variability on statistical timing behavior

David Blaauw, Christopher J. Progler, Amir Borna, 2004, SPIE Advanced Lithography.

Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node

Kafai Lai, Lars W. Liebmann, Carlos Fonseca, 2002, SPIE Advanced Lithography.

Defect printability in CPL mask technology

Will Conley, Christopher J. Progler, Robert J. Socha, 2004, SPIE Advanced Lithography.

Exploring complex 2D layouts for 22nm node using double patterning/double etch approach for trench levels

Christopher J. Progler, Scott William Jessen, Brian Dillon, 2010, Advanced Lithography.

Scattered light: the increasing problem for 193-nm exposure tools and beyond

Kafai Lai, Christopher J. Progler, ChungHsi J. Wu, 2001, SPIE Advanced Lithography.

Tunable transmission phase mask options for 65/45nm node gate and contact processing

Will Conley, Jonathan L. Cobb, Michael Cangemi, 2004, SPIE Advanced Lithography.

Design-Aware Mask Inspection

Puneet Gupta, Steve McDonald, Christopher J. Progler, 2010, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.

Potential causes of across field CD variation

Hong Du, Christopher J. Progler, Greg Wells, 1997, Advanced Lithography.

Interaction of pattern orientation and lens quality on CD and overlay errors

Scott J. Bukofsky, Christopher J. Progler, 2000, Advanced Lithography.

Investigation of viable approaches to AAPSM intensity imbalance reduction for 65nm lithography

Tejas Jhaveri, Christopher J. Progler, Yuan Zhang, 2004, SPIE Advanced Lithography.

Toward large-area simulation of e-beam lithography

Christopher J. Progler, Martin Bohn, Ulrich Hofmann, 2003, SPIE Photomask Technology.

Cost effective lithography approaches for ASIC circuits

David Pinto, Christopher J. Progler, Dipankar Pramanik, 2003, SPIE Advanced Lithography.

The optics of photomasks: from shadowy past to scattered future

Christopher J. Progler, 2006, SPIE Advanced Lithography.

Cost-driven mask strategies considering parametric yield, defectivity, and production volume

Andrew B. Kahng, Christopher J. Progler, Kwangok Jeong, 2011 .

Exploring new high speed mask aware RET verification flows

Bryan S. Kasprowicz, Christopher J. Progler, James N. Wiley, 2005, Photomask Japan.

CPL reticle technology for advanced device applications

Kevin D. Lucas, Philippe Thony, Christopher J. Progler, 2004, Photomask Japan.

Method to budget and optimize total device overlay

Christopher J. Progler, Donald C. Wheeler, Scott J. Bukofsky, 1999, Advanced Lithography.

Minimization of image placement errors in chromeless phase-shift mask lithography

Christopher J. Progler, Peter D. Rhyins, Susan G. Cann, 2002, SPIE Advanced Lithography.

The impact of MEEF through pitch for 120-nm contact holes

Will Conley, Kevin D. Lucas, Robert John Socha, 2004, SPIE Advanced Lithography.

Optical lens specifications from the user's perspective

Christopher J. Progler, Donald C. Wheeler, 1998, Advanced Lithography.

Special Section Guest Editorial: Photomasks for EUV Lithography

Frank E. Abboud, Christopher J. Progler, 2013 .

The application of CPL reticle technology for the 0.045-mm node

Will Conley, Kevin D. Lucas, Fung Chen, 2004, SPIE Advanced Lithography.

Process margin improvement using custom transmission EAPSM reticles

Erik Byers, Christopher J. Progler, Brett J. Rolfson, 2007, SPIE Advanced Lithography.

New yield-aware mask strategies

Andrew B. Kahng, Christopher J. Progler, Kwangok Jeong, 2011, Photomask Japan.

Optical Microlithography XIV

Christopher J. Progler, 2001 .

Illuminator design for the printing of regular contact patterns

Anthony Yen, Christopher J. Progler, Martin Burkhardt, 1998 .

Materials Selections and Growth Conditions for Large‐Area, Multilayered, Visible Negative Index Metamaterials Formed by Nanotransfer Printing

John A. Rogers, Daniel Franklin, Christopher J. Progler, 2014 .

Understanding chromatic aberration impacts on lithographic imaging

Nigel R. Farrar, Christopher J. Progler, Kafai Lai, 2003 .