Tim Fühner

发表

Application of artificial neural networks to compact mask models in optical lithography simulation

Andreas Erdmann, Peter Evanschitzky, Viviana Agudelo, 2013 .

Lithography simulation: modeling techniques and selected applications

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2009, Optical Metrology.

Optimization of mask absorber stacks and illumination settings for contact hole imaging

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2008, Photomask Japan.

Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems

Gabriella Kókai, Andreas Erdmann, Tim Fühner, 2004, EvoWorkshops.

Direct optimization approach for lithographic process conditions

Andreas Erdmann, Sebastian Seifert, Tim Fühner, 2007 .

Efficient optimization of lithographic process conditions using a distributed, combined global/local search approach

Christoph Dürr, Andreas Erdmann, Tim Fühner, 2006, SPIE Advanced Lithography.

A simulation study on the impact of lithographic process variations on CMOS device performance

Ina Kodrasi, Andreas Erdmann, Tim Fühner, 2008, SPIE Advanced Lithography.

Mutual source, mask and projector pupil optimization

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2012, Advanced Lithography.

Rigorous electromagnetic field simulation of two-beam interference exposures for the exploration of double patterning and double exposure scenarios

Cheng-Bai Xu, Andreas Erdmann, Peter Evanschitzky, 2008, SPIE Advanced Lithography.

Accuracy and performance of 3D mask models in optical projection lithography

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2011, Advanced Lithography.

Dr.LiTHO: a development and research lithography simulator

Andreas Erdmann, Tim Fühner, Thomas Schnattinger, 2007, SPIE Advanced Lithography.

Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2010, European Mask and Lithography Conference.

An integrated source/mask/DSA optimization approach

Ulrich Welling, Andreas Erdmann, Tim Fühner, 2016, Advanced Lithography.

Compensation of mask induced aberrations by projector wavefront control

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2011, Advanced Lithography.

Efficient simulation and optimization of wafer topographies in double patterning

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2009, Advanced Lithography.

Modeling of industrial bulk crystal growth—state of the art and challenges

Tim Fühner, Bernd Fischer, Jochen Friedrich, 2005 .

LisBON: A framework for parallelisation and hybridisation of optimisation algorithms

Ponnuthurai N. Suganthan, Tim Fühner, C. Dürr, 2007, 2007 IEEE Congress on Evolutionary Computation.

A novel framework for distributing computations DisPyTE – distributing Python tasks environment

Tim Fühner, Thomas Jung, Stephan Popp, 2006 .

Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects

Feng Shao, Eric Hendrickx, Gian F. Lorusso, 2011, Optical Systems Design.

Artificial Evolution for the Optimization of Lithographic Process Conditions

Tim Fühner, 2014 .

Genetic Algorithm for Optimization and Calibration in Process Simulation

Andreas Erdmann, Tim Fühner, Jürgen Lorenz, 2004 .

Rigorous simulation and optimization of the lithography/directed self-assembly co-process

Ulrich Welling, Andreas Erdmann, Tim Fühner, 2014, Advanced Lithography.

Impact of EUV absorber variations on wafer patterning

Lawrence S. Melvin, Andreas Frommhold, Ulrich Welling, 2019, Advanced Lithography.

Modeling studies on alternative EUV mask concepts for higher NA

Jens Timo Neumann, Peter Evanschitzky, Tim Fühner, 2013, Advanced Lithography.

The impact of the mask stack and its optical parameters on the imaging performance

Andreas Erdmann, Peter Evanschitzky, Sebastian Seifert, 2007, SPIE Advanced Lithography.

Incorporating Linkage Learning into the GeLog Framework

Gabriella Kókai, Tim Fühner, 2003, Acta Cybern..

Application of artificial neural networks to compact mask models in optical lithography simulation

Andreas Erdmann, Peter Evanschitzky, Viviana Agudelo, 2013, Advanced Lithography.

Defect parameters retrieval based on optical projection images

Sikun Li, Andreas Erdmann, Xiangzhao Wang, 2013, Optical Metrology.

Rigorous mask modeling using waveguide and FDTD methods: an assessment for typical hyper-NA imaging problems

Peter De Bisschop, Andreas Erdmann, Peter Evanschitzky, 2006, Photomask Japan.

Simulation-based EUV source and mask optimization

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2008, Photomask Technology.

Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model

Edmund Y. Lam, Andreas Erdmann, Tim Fühner, 2017 .

Extended Abbe approach for fast and accurate lithography imaging simulations

Peter Evanschitzky, Tim Fühner, Andreas Erdmann, 2009, European Mask and Lithography Conference.

Mask diffraction analysis and optimization for EUV masks

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2009, Advanced Lithography.

Exploration of linear and non-linear double exposure techniques by simulation

Feng Shao, John S. Petersen, Andreas Erdmann, 2009, Advanced Lithography.

Impact of EUV mask absorber sidewall angle on patterning robustness

Lawrence S. Melvin, Tim Fühner, Yudhishthir Kandel, 2018, Advanced Lithography.

Efficient analysis of three dimensional EUV mask induced imaging artifacts using the waveguide decomposition method

Feng Shao, Peter Evanschitzky, Tim Fühner, 2009, Photomask Technology.

Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography

Andreas Erdmann, Peter Evanschitzky, Viviana Agudelo, 2012, Advanced Lithography.

Topography-aware BARC optimization for double patterning

Feng Shao, Shijie Liu, Andreas Erdmann, 2010, Advanced Lithography.

EvolVision – an Evolvica visualization tool

Tim Fühner, Christian Jacob, 2001 .

Pixel-based defect detection from high-NA optical projection images.

Andreas Erdmann, Tim Fühner, Dongbo Xu, 2014, Applied optics.

Rigorous diffraction simulations of topographic wafer stacks in double patterning

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2009 .

Efficient simulation and optimization of wafer topographies in double patterning

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2009 .

Mask diffraction analysis and optimization for extreme ultraviolet masks

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2010 .