Matthew T. Shaw

The 2010 VERITAS Data Network Upgrade

Matthew T. Shaw, 2010 .

An in-situ hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate

Ramsankar Senthamaraikannan, Justin D. Holmes, Tandra Ghoshal, 2014, Advanced Lithography.

Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process

Justin D. Holmes, Tandra Ghoshal, Atul Chaudhari, 2014, Advanced Lithography.

A general method for controlled nanopatterning of oxide dots: a microphase separated block copolymer platform

Justin D. Holmes, Tandra Ghoshal, Michael A. Morris, 2012 .

Plasma etch technologies for the development of ultra-small feature size transistor devices

Justin D. Holmes, Richard A. Farrell, Michael A. Morris, 2011 .

Monitoring PMMA Elimination by Reactive Ion Etching from a Lamellar PS-b-PMMA Thin Film by ex Situ TEM Methods

Justin D. Holmes, Richard A. Farrell, Nikolay Petkov, 2010 .

A vertical lamellae arrangement of sub-16 nm pitch (domain spacing) in a microphase separated PS-b-PEO thin film by salt addition

Justin D. Holmes, Tandra Ghoshal, Apostolos Avgeropoulos, 2015 .

The Morphology of Ordered Block Copolymer Patterns as Probed by High Resolution Imaging

Justin D. Holmes, Nikolay Petkov, Tandra Ghoshal, 2014 .