Walter Steinberg

Actual measurement data obtained on new 65nm generation mask metrology tool set

Gerd Scheuring, Frank Hillmann, Klaus-Dieter Roth, 2005, Other Conferences.

Development and characterization of new CD mask standards: a status report

Lutz Bettin, Werner Mirande, Bernd Brendel, 2003, European Mask and Lithography Conference.

Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs

John M. Whittey, Gerhard W.B. Schlueter, Walter Steinberg, 2002, SPIE Photomask Technology.

Measurement results on after-etch resist coated features on the new Leica Microsystems' LWM270 DUV critical dimension metrology system

John M. Whittey, Walter Steinberg, 2004, European Mask and Lithography Conference.