Yuichiro Miyata

Incorporation of direct current superposition as a means for high quality contact and slotted contact structures utilizing litho-freeze-litho-etch

Jeffrey Smith, Nihar Mohanty, Anton de Villiers, 2014, 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014).

The defect mitigation on EUV stack by track based technology

Nelson Felix, Cody Murray, Karen Petrillo, 2019, Advanced Lithography.

Critical dimension control for prevention of wafer-to-wafer and module-to-module difference

Yuichiro Miyata, Kouichirou Tanaka, Yuji Matsuyama, 2004, SPIE Advanced Lithography.

Physical properties of the bed material that is suitable for reproduction experiment of free meandering

Yuichiro Miyata, Kazuki Yoshida, 2013 .

Line-pattern collapse mitigation status for EUV at 32nm HP and below

Yuichiro Miyata, Shinichiro Kawakami, Michael A. Carcasi, 2012, Other Conferences.

Experimental study on mud crack patterns.

Yuichiro Miyata, Hiroyuki Ito, Y. Miyata, 1998 .