Yaojun Du

The pattern-matching based OPC approach for preemptively fixing the weak points

Yaojun Du, 2017, Advanced Lithography.

Predicting the Interbank Capital Adequacy Level Based on Financial Data Analysis

Liping Shen, Fangjun Wang, Yaojun Du, 2019, Intelligent Environments.

The incorporation of the pattern matching approach into a post-OPC repair flow

Yaojun Du, 2017, 2017 China Semiconductor Technology International Conference (CSTIC).

A model-based approach for the scattering-bar printing avoidance

Feng Shao, Liang Li, Yunfei Deng, 2018, Advanced Lithography.