Su-Young Lee

Requirements of nano-machining repair system for 45-nm node

Han-Ku Cho, Hyuk-Joo Kwon, Sang-Gyun Woo, 2007, Photomask Japan.

Analysis of process margin in EUV mask repair with nano-machining

Sang-Gyun Woo, Seong-Yong Moon, Jung-Hwan Lee, 2008, Photomask Technology.

Effects of multilayer period on EUVL imaging for 2X node and beyond

Hwan-Seok Seo, Chan-Uk Jeon, Sang-Hyun Kim, 2013, Advanced Lithography.