Max I. Robertson

Cost-effective fabrication of optical components using sub-nanometer closed-loop control of the polishing surface shape

Max I. Robertson, Peter Barrie, 1992, Other Conferences.

Fluorination of polycrystalline diamond films and powders. An investigation using FTIR spectroscopy, SEM, energy-filtered TEM, XPS and fluorine-18 radiotracer methods

Max I. Robertson, D. McComb, T. Klapötke, 2001 .

Chemomechanical polishing of gallium arsenide and cadmium telluride to subnanometre surface finish. Evaluation of the action and effectiveness of hydrogen peroxide, sodium hypochlorite and dibromine as reagents

Max I. Robertson, S. McMeekin, J. M. Winfield, 1994 .

Direct evidence for the formation of a passivating layer during chemomechanical polishing of silica by a hydrogen difluoride-based reagent

Max I. Robertson, J. A. Chudek, J. M. Winfield, 1993 .

Halogen etching of group 13–15 (3–5) semiconductors and its relevance to chemical–mechanical polishing. The reactions of dibromine, dichlorine and sodium hypochlorite with gallium arsenide and related materials

Max I. Robertson, J. M. Winfield, R. Peacock, 1997 .

Chemomechanical polishing of gallium arsenide to subnanometre surface finish. An evaluation of hydrogen peroxide and dibromine as reagents

Max I. Robertson, S. McMeekin, J. M. Winfield, 1992 .