Toshihisa Anazawa

Evaluation of the contamination removal capability and multilayer degradation in various cleaning methods

Osamu Suga, Iwao Nishiyama, Noriaki Takagi, 2010, Photomask Technology.

Carbon contamination of EUV mask: film characterization, impact on lithographic performance, and cleaning

Yasushi Nishiyama, Osamu Suga, Kazuki Abe, 2008, SPIE Advanced Lithography.

Interaction of hydrogen with ZrC(111) surface: angle-resolved photoemission study

Hiroo Kato, Toshihisa Anazawa, Shigeki Otani, 1996 .