Hideaki Matsuhashi

2.5 Gb/s 1:8 DEMUX IC Composed of 0.15μm Single-Gate CMOS (Special Issue on Ultra-High-Speed IC and LSI Technology)

Satoshi Nishikawa, Toshiyuki Ochiai, Hiroshi Hoga, 1999 .

0.15µm Fully Depleted SOI for Mixed-Signal Applications up to 250°C: Are We Approaching the Limits of Device Scaling for High-Temperature Electronics ?

Denis Flandre, Valeriya Kilchytska, Pierre Delatte, 2003 .

Fully depleted SOI process and device technology for digital and RF applications

Shunsuke Baba, Norio Hirashita, F. Ichikawa, 2003 .

Noise modeling and performance in 0.15-μm fully depleted SOI MOSFET

Jean-Pierre Raskin, Francois Danneville, Gilles Dambrine, 2004, SPIE International Symposium on Fluctuations and Noise.

High-Accuracy Machining of Thin-Walled Workpiece by Non-Rotational Tool-Analysis of Machining Accuracy Based on Deflection of Tool and Workpiece Using FEM-

Hiroyasu Iwabe, Hideaki Matsuhashi, Hayato Akutsu, 2010, Int. J. Autom. Technol..

Study on Machining Accuracy of Scroll Shape Workpiece with Polar Coordinate Method

Hiroyasu Iwabe, Masahide Kobayashi, Hideaki Matsuhashi, 2000 .

Study on Machining Accuracy of Scroll Shape Workpiece with Polar Coordinate Method

Hiroyasu Iwabe, Masahide Kobayashi, Hideaki Matsuhashi, 2002 .

1109 Study on High Accurate Machining of Scroll Wall by Non Rotating Tool : Analysis of Machining Accuracy based on Tool Deformation using FEM

Hiroyasu Iwabe, Hideaki Matsuhashi, Hideto Fukuyama, 2005 .