Masanobu Hasegawa

发表

Investigation of the influence of NC controller and control mode by machining tests of blades on machining time

Masanobu Hasegawa, Akira Saito, Takayuki Iwasaki, 2017 .

Development of low-loss optical coatings for 157-nm lithography

Akira Tanaka, Masanobu Hasegawa, Yasuyuki Suzuki, 2002, SPIE Advanced Lithography.

Measurement of absorptance of optical coatings for F2 lithography

Masanobu Hasegawa, Akira Matsumoto, Kazuho Sone, 2001, SPIE Optics + Photonics.

Double-grating lateral shearing interferometer for EUV optics at-wavelength measurement

Masanobu Hasegawa, Akiyoshi Suzuki, Katsuhiko Murakami, 2005, SPIE Advanced Lithography.

New resolution enhancement method realizing the limit of single mask exposure

Masanobu Hasegawa, Akiyoshi Suzuki, Kenji Saitoh, 2002, Photomask Japan.

Practical applications of IDEAL exposure method

Masanobu Hasegawa, Akiyoshi Suzuki, Kenji Saitoh, 1999, Photomask Technology.

Comparisons between EUV at-wavelength metrological methods

Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, 2005, SPIE Optics + Photonics.

Motion Accuracy Enhancement of Five-Axis Machine Tools by Modified CL-Data

Masanobu Hasegawa, Ryuta Sato, Keiichi Shirase, 2018, Int. J. Autom. Technol..

New approach for realizing k1=0.3 optical lithography

Masanobu Hasegawa, Akiyoshi Suzuki, Kenji Saito, 1999, Photomask and Next Generation Lithography Mask Technology.

Method of Planning Tool Postures for Deep Groove Machining of Complex Shapes - Development of an Automatic Planning Method that Considers the Motions of the Rotational Axis when the Tool Reverses Direction in Grooved Shapes -

Kohei Ichikawa, Masanobu Hasegawa, Jun'ichi Kaneko, 2017, Int. J. Autom. Technol..

Comparison of EUV interferometry methods in EUVA project

Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, 2005, SPIE Advanced Lithography.

Planning Method of Tool Posture for Complex Shape Deep Groove Machining: -Development of Automatic Planning Method Considering for the Rotation Axis Movement in Tool Move Back Inside of Deep Narrow Grooves-@@@-溝内部での工具折り返しにおける機械軸動作を考慮した自動計画法の開発-

Kohei Ichikawa, Masanobu Hasegawa, Jun'ichi Kaneko, 2016 .

Development suppress method of processing speed reduction by correction of turning axis command value in 5-axis control machining

Masanobu Hasegawa, Kenichi Horio, Jun'ichi Kaneko, 2019 .

SMS-04: Research and Development of Multi-Ferroic Materials and Devices for Smart Systems(SMS-I: SMART MATERIALS AND STRUCTURES, NDE)

Masanobu Hasegawa, Young Chul Park, Yasubumi Furuya, 2005 .

IDEAL double exposure method for polylevel structures

Masanobu Hasegawa, Akiyoshi Suzuki, Paolo Canestrari, 2000, Advanced Lithography.

EUV wavefront metrology at EUVA

Masanobu Hasegawa, Mitsuo Takeda, Hideo Yokota, 2006, SPIE Advanced Lithography.

Lateral shearing interferometer for EUVL: theoretical analysis and experiment

Masanobu Hasegawa, Akiyoshi Suzuki, Katsuhiko Murakami, 2004, SPIE Advanced Lithography.

Challenging the limit of single mask exposure

Masanobu Hasegawa, Akiyoshi Suzuki, Kenji Saitoh, 2002, SPIE Advanced Lithography.

EUV wavefront measurement of six-mirror optics using EWMS

Masanobu Hasegawa, Hideo Yokota, Takayuki Hasegawa, 2008, SPIE Advanced Lithography.

EUV wavefront metrology system in EUVA

Masanobu Hasegawa, Akiyoshi Suzuki, Takayuki Hasegawa, 2004, SPIE Advanced Lithography.

Recent progress of EUV wavefront metrology in EUVA

Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, 2004, SPIE Optics + Photonics.

Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI

Masanobu Hasegawa, Akiyoshi Suzuki, Katsuhiko Murakami, 2004, SPIE Advanced Lithography.

Comparison of Japanese and European NCs through Wing Profile Machining Test

Masanobu Hasegawa, Akira Saito, Ryuta Sato, 2016 .

Improvement of Simultaneous 5-Axis Controlled Machining Accuracy by CL-Data Modification

Masanobu Hasegawa, Akira Saito, Takayuki Iwasaki, 2019, Int. J. Autom. Technol..

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Kazuya Ota, Masanobu Hasegawa, Akiyoshi Suzuki, 2003, SPIE Advanced Lithography.

Motion Accuracy Enhancement of 5-axis Machine Tools by Modified CL-data

Masanobu Hasegawa, Akira Saito, Ryuta Sato, 2017 .

Experimental comparison of absolute PDI and lateral shearing interferometer

Masanobu Hasegawa, Akiyoshi Suzuki, Katsuhiko Murakami, 2005, SPIE Advanced Lithography.

Shearing interferometry for at wavelength wavefront measurement of extreme-ultraviolet lithography projection optics

Kazuya Ota, Masanobu Hasegawa, Akiyoshi Suzuki, 2003 .

Double-grating lateral shearing interferometer for extreme ultraviolet lithography

Masanobu Hasegawa, Katsuhiko Murakami, Jun Saito, 2004 .

Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography.

Masanobu Hasegawa, Akiyoshi Suzuki, Masahito Niibe, 2007, Applied optics.

Ultra High-Precision Wavefront Metrology Using EUV Low Brightness Source

Masanobu Hasegawa, Mitsuo Takeda, Katsuhiko Murakami, 2014 .

EUVA’s challenges toward 0.1nm accuracy in EUV at-wavelength interferometry

Masanobu Hasegawa, Akiyoshi Suzuki, Mitsuo Takeda, 2006 .

Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement.

Masanobu Hasegawa, Akira Tanaka, Ryuji Biro, 2002, Applied optics.

Development of optical coatings for 157-nm lithography. I. Coating materials.

Masanobu Hasegawa, Akira Tanaka, Ryuji Biro, 2002, Applied optics.

Wave-front errors of reference spherical waves in high-numerical aperture point diffraction interferometers

Kazuya Ota, Masanobu Hasegawa, Akiyoshi Suzuki, 2004 .