Johan Aman

Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes

Johan Karlsson, Marie Jacobsson, Andrzej Karawajczyk, 2003, SPIE Photomask Technology.

Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator

Angela Beyerl, Andrzej Karawajczyk, Mans Bjuggren, 2004, Photomask Japan.