Takehiko Katsumata

EBM-5000: electron-beam mask writer for 45-nm node

Takashi Kamikubo, Noriaki Nakayamada, Hirohito Anze, 2006, Photomask Japan.

Study of heating effect on CAR in electron beam mask writing

Takashi Kamikubo, Jun Yashima, Hirohito Anze, 2007, Photomask Japan.

Electron-beam mask writer EBM-6000 for 45 nm HP node

Yusuke Sakai, Jun Yashima, Noriaki Nakayamada, 2007, Photomask Japan.

Key improvement schemes of accuracies in EB mask writing for double patterning lithography

Jun Takamatsu, Takashi Kamikubo, Hirohito Anze, 2008, European Mask and Lithography Conference.