Sasangan Ramanathan

Needs for Next Generation Memory and Enabling Solutions based on Advanced Vaporizer Technology

Johannes Lindner, Z. Karim, Yoshi Senzaki, 2009 .

Material and Tool Design Challenges for Taking ALD to High Volume Production Beyond 30nm Node

Z. Karim, Sasangan Ramanathan, B. Lu, 2011 .

Atomic layer deposition of hafnium oxide thin films from tetrakis (dimethylamino) hafnium (TDMAH) and ozone

Thomas E. Seidel, Sasangan Ramanathan, Xinye Liu, 2003 .

Process Optimization in Atomic Layer Deposition of High-K Oxides for Advanced gate Stack Engineering

Thomas E. Seidel, Sasangan Ramanathan, Chew Hoe Ang, 2002 .

ALD of Hafnium Oxide Thin Films from Tetrakis(ethylmethylamino)hafnium and Ozone

Roy G. Gordon, Thomas E. Seidel, Sasangan Ramanathan, 2005 .