R. F. De Keersmaecker

The Sustain Network on Submicron Silicon Technology

Kris De Meyer, R. F. De Keersmaecker, 1994 .

The ADEQUAT project for advanced CMOS process module development

R. F. De Keersmaecker, 1996 .

Hole trapping and interface state generation during bias‐temperature stress of SiO2 layers

R. F. De Keersmaecker, S. K. Haywood, 1985 .

Impact of Patterned Layers on Temperature Non-Uniformity during Rapid Thermal Processing for VLSI-Applications

Karen Maex, R. F. De Keersmaecker, P. Vandenabeele, 1989 .

The statistics of dielectric breakdown in MOS capacitors under static and dynamic voltage stress

R. F. De Keersmaecker, S. K. Haywood, M. Heyns, 1987 .

Electron trapping in SiO2 at 295 and 77 °K

Hisham Z. Massoud, Eugene A. Irene, D. R. Young, 1979 .

Oxide field dependence of SiSiO2 interface state generation and charge trapping during electron injection

R. F. De Keersmaecker, M. Heyns, R. D. Keersmaecker, 1989 .