Mary Silva

Alternating phase shift mask technology for 65nm logic applications

Jian Ma, Wen-Hao Cheng, Jeff Farnsworth, 2006, SPIE Advanced Lithography.

Employment and Training Administration Job Corps: Final Finding of No Significant Impact (FONSI) for the New Jobs Corps Center on the Loring AFB in Caribou, ME

Mary Silva, 1996 .

Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase shift mask

Jian Ma, Kishore K. Chakravorty, Yulia O. Korobko, 2005, SPIE Photomask Technology.