Kyounghoon Han

Automatic End Point Detection of Plasma Etching Process Using the Multi-Way PCA of the Whole Optical Emission Spectrum

Jae Won Lee, En Sup Yoon, Sang Kyun Park, 2006, 2006 SICE-ICASE International Joint Conference.

Web-based Automatic Hazard Evaluation using the Multi-Distinction Equipment Screen Algorithm

Dongil Shin, Sung Joon Ahn, En Sup Yoon, 2004 .

Principal Component Analysis Based Support Vector Machine for the End Point Detection of the Metal Etch Process

En Sup Yoon, Heeyeop Chae, Kyounghoon P. Han, 2008 .

Multi-way principal component analysis for the endpoint detection of the metal etch process using the whole optical emission spectra

En Sup Yoon, Heeyeop Chae, Kyounghoon P. Han, 2008 .

Real-Time End-Point Detection Using Modified Principal Component Analysis for Small Open Area SiO2 Plasma Etching

En Sup Yoon, Heeyeop Chae, Kyounghoon P. Han, 2008 .