Martin C. Peckerar

发表

Toward a retinal prosthesis for the blind: advanced microelectronics combined with a nanochannel glass electrode array

Charles D. Merritt, J. G. Howard, Dean A. Scribner, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

Advanced transformational analysis applied to e-beam proximity effect correction

Ronald R. Coifman, Eytan Barouch, Martin C. Peckerar, 1993, Advanced Lithography.

Sensing macromolecules with microelectronics

Martin C. Peckerar, F. Keith Perkins, Leonard M. Tender, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

Soft x-ray (14 nm) lithography with ultrathin imaging layers and selective electroless metallization

Franco Cerrina, Obert R. Wood, Charles S. Dulcey, 1993, Advanced Lithography.

Nanostructures and biology: some introductory remarks

Michael T. Postek, Martin C. Peckerar, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

Reactive-ion etching of tungsten for high-resolution x-ray masks

Martin C. Peckerar, Charles R. Eddy, Christie R. Marrian, 1994, Advanced Lithography.

Notes from the nist/nrl/spie workshop on nanostructure science, metrology & technology: Microelectronics group

Michael T. Postek, Martin C. Peckerar, 2002 .

Nanoscience: a new thrust for science in the 21st century?

Martin C. Peckerar, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

High-aspect-ratio resist structures for optoelectronic (and other) applications

Milton Rebbert, Martin C. Peckerar, Ganesh K. Gopalakrishnan, 1994, Other Conferences.

A Low Cost Micro-Hot-Plate for Disposable Aerosol Generation Applications

Chao Wang, Wei Zhao, Martin C. Peckerar, 2013 .

Comparison of dry-etch approaches for tungsten patterning

Martin C. Peckerar, K. W. Rhee, Orest J. Glembocki, 1994, Advanced Lithography.

Report out of the military sciences working group

Michael T. Postek, Martin C. Peckerar, M. Peckerar, 2002 .

Nanolithography with Electron Beams: Theory and Practice

Martin C. Peckerar, K. W. Rhee, C. R. K. Marrian, 2002 .

Thin silicon nitride films to increase resolution in e-beam lithography

Mario G. Ancona, Martin C. Peckerar, K. W. Rhee, 1993, Advanced Lithography.

Metrology break-out group

Michael T. Postek, Martin C. Peckerar, 2002 .

CCD's for High Resolution Imaging in the Near and Far UV

Martin C. Peckerar, J. T. Bosiers, D. J. Michels, 1986, Optics & Photonics.

Advanced Materials Processes for Bio-Probes

Milton Rebbert, Martin C. Peckerar, M. Peckerar, 1992 .

Comparative mobility degradation in modulation‐doped GaAs devices after e‐beam and x‐ray irradiation

Dimitri A. Antoniadis, Michael R. Melloch, Martin C. Peckerar, 1992 .

Sub-0.1 μ electron-beam lithography for nanostructure development

Martin C. Peckerar, K. W. Rhee, M. Peckerar, 2000 .

Feature contrast in dose‐equalization schemes used for electron‐beam proximity control

Martin C. Peckerar, F. Keith Perkins, Christie R. K. Marrian, 1996 .

X‐ray sensitivity of a charge‐coupled‐device array

Martin C. Peckerar, W. D. Baker, D. J. Nagel, 1977 .

Novel technique for improving pattern placement in membrane mask making

Martin C. Peckerar, F. Keith Perkins, Christie R. K. Marrian, 1997 .

Issues in Nanolithography for Quantum Effect Device Manufacture

Martin C. Peckerar, F. Keith Perkins, Orest J. Glembocki, 1997 .

An error measure for dose correction in e‐beam nanolithography

A. Teolis, Martin C. Peckerar, K. W. Rhee, 1990 .

Patterning tungsten films with an electron beam lithography system at 50 keV for x-ray mask applications

Martin C. Peckerar, K. W. Rhee, J. M. Andrews, 1991 .

Characterization of thin boron‐doped silicon membranes by double‐crystal x‐ray topography

Martin C. Peckerar, Syed B. Qadri, David I. Ma, 1989 .

Deep ultraviolet patterning of monolayer films for high resolution lithography

Mu-San Chen, Charles S. Dulcey, Martin C. Peckerar, 1991 .

Modeling of electron elastic and inelastic scattering

Martin C. Peckerar, K. W. Rhee, Christie R. K. Marrian, 1996 .

Reactive ion etching of high‐aspect‐ratio 100 nm linewidth features in tungsten

Martin C. Peckerar, K. W. Rhee, William Chu, 1994 .

An Electrochemical Cell with Capacitance-Enhanced Double Layer

Neil Goldsman, Martin C. Peckerar, Leonard M. Tender, 2007 .

Improving pattern placement using through-the-membrane signal monitoring

Martin C. Peckerar, Christie R. K. Marrian, F. K. Perkins, 1998 .

X‐ray imaging with a charge‐coupled device fabricated on a high‐resistivity silicon substrate

Martin C. Peckerar, D. H. McCann, M. Peckerar, 1981 .