Hitoshi Komuro

High-precision contouring from SEM image in 32-nm lithography and beyond

Hiroyuki Shindo, Thuy Do, Ir Kusnadi, 2009, Advanced Lithography.

Improvement of optical proximity-effect correction model accuracy by hybrid optical proximity-effect correction modeling and shrink correction technique for 10-nm node process

Scott Halle, Nicole Saulnier, Shunsuke Koshihara, 2016 .

Hybrid OPC modeling with SEM contour technique for 10nm node process

Scott Halle, Atsuko Yamaguchi, Shunsuke Koshihara, 2014, Advanced Lithography.