Sang-In Lee

Characteristics of PECVD-WNx as a Diffusion Barrier for ULSI DRAM Applications

Moonyong Lee, Young Sun Kim, Young Wook Park, 1995 .

Novel integration technology with capacitor over metal (COM) by using self-aligned dual damascene (SADD) process for 0.15 /spl mu/m stand-alone and embedded DRAMs

Kinam Kim, Jong-Ho Lee, Won Seok Lee, 1999 .

ELECTRICAL CHARACTERIZATION OF Pt / ( Ba , Sr ) TiO3 / Pt CAPACITORS FOR ULSI DRAM APPLICATIONS

Soon Oh Park, Cheol Seong Hwang, Chang Suk Kang, 1995 .