R. Johnson

Challenges and opportunities of extremely thin SOI (ETSOI) CMOS technology for future low power and general purpose system-on-chip applications

B. Jagannathan, N. Loubet, P. Kulkarni, 2010, Proceedings of 2010 International Symposium on VLSI Technology, System and Application.

ETSOI CMOS for system-on-chip applications featuring 22nm gate length, sub-100nm gate pitch, and 0.08µm2 SRAM cell

N. Loubet, P. Kulkarni, H. Bu, 2011, 2011 Symposium on VLSI Technology - Digest of Technical Papers.

Extremely thin SOI (ETSOI) technology: Past, present, and future

P. Kulkarni, H. Bu, A. Khakifirooz, 2010, 2010 IEEE International SOI Conference (SOI).

UTBB FDSOI transistors with dual STI for a multi-Vt strategy at 20nm node and below

O. Rozeau, O. Faynot, M. Vinet, 2012, 2012 International Electron Devices Meeting.

Wafer-scale oxide fusion bonding and wafer thinning development for 3D systems integration: Oxide fusion wafer bonding and wafer thinning development for TSV-last integration

R. Hannon, S. Kanakasabapathy, A. Upham, 2012, 2012 3rd IEEE International Workshop on Low Temperature Bonding for 3D Integration.

High performance extremely thin SOI (ETSOI) hybrid CMOS with Si channel NFET and strained SiGe channel PFET

M. Vinet, L. Grenouillet, T. Nagumo, 2012, 2012 International Electron Devices Meeting.

FDSOI CMOS devices featuring dual strained channel and thin BOX extendable to the 10nm node

O. Faynot, Y. Escarabajal, B. Lherron, 2014, 2014 IEEE International Electron Devices Meeting.

22 nm technology compatible fully functional 0.1 μm2 6T-SRAM cell

M. Raymond, M. Burkhardt, S. Paparao, 2008, 2008 IEEE International Electron Devices Meeting.

A low-cost modular SiGe BiCMOS technology and analog passives for high-performance RF and wide-band applications

S. Molloy, M. Mastrapasqua, M. Carroll, 2000, Proceedings of the 2000 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.00CH37124).

ESD robustness of a BiCMOS SiGe technology

James S. Dunn, Bernard S. Meyerson, David L. Harame, 2000, Proceedings of the 2000 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.00CH37124).

Current status and future trends of SiGe BiCMOS technology

Alvin J. Joseph, James S. Dunn, David L. Harame, 2001 .