Mark A. Schmidt

Multilayer coated optics for an alpha-class extreme ultraviolet lithography system

Russell M. Hudyma, Christopher C. Walton, Marco Wedowski, 1999, Optics & Photonics.

Advances in multilayer reflective coatings for extreme ultraviolet lithography

Troy W. Barbee, Saša Bajt, Paul B. Mirkarimi, 1999, Advanced Lithography.

Smoothing of diamond-turned substrates for extreme ultraviolet illuminators

Regina Soufli, Sherry L. Baker, Eric M. Gullikson, 2004 .