Dennis R. McKean

Rational design of bleachable nonchemically amplified DUV photoactive compounds

C. Grant Willson, Cyrus E. Tabery, David R. Medeiros, 2001, SPIE Advanced Lithography.

Highly etch resistant, negative resist for deep-UV and electron beam lithography

Nicholas J. Clecak, Lester A. Pederson, Dennis R. McKean, 1990, Advanced Lithography.

Acid photogeneration from sulfonium salts in solid polymer matrices

Scott A. MacDonald, Dennis R. McKean, Ulrich P. Schaedeli, 1989 .

DESIGN OF A POSITIVE RESIST FOR PROJECTION LITHOGRAPHY IN THE MID UV.

Donald C. Hofer, Grant Willson, Nicholas J. Clecak, 1983 .

Brönsted Acid Generation from Triphenylsulfonium Salts in Acid-Catalyzed Photoresist Films

Scott A. MacDonald, Dennis R. McKean, Ulrich P. Schaedeli, 1989 .