Thorsten Lill

发表

Patterning in the era of atomic scale fidelity

Richard A. Gottscho, Jeffrey Marks, Yoshie Kimura, 2015, Advanced Lithography.

(Invited) Patterning of Embedded STT-MRAM Devices: Challenges and Solutions

Thorsten Lill, 2018 .

Plasma-assisted thermal atomic layer etching of Al2O3

Andreas Fischer, Richard A. Gottscho, Yang Pan, 2017, Advanced Lithography.

Holistic Integrated Process Solutions for Patterning Phase Change Memory Devices

Danna Qian, Jim Sims, Rafal Dylewicz, 2021, ECS Meeting Abstracts.

Etching mechanisms of HfO2, SiO2, and poly-Si substrates in BCl3 plasmas

Olivier Joubert, Erwine Pargon, Gilles Cunge, 2007 .

Characterization of resist-trimming processes by quasi in situ x-ray photoelectron spectroscopy

Olivier Joubert, Erwine Pargon, Songlin Xu, 2004 .

Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing

Olivier Joubert, Erwine Pargon, Gilles Cunge, 2010 .

Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists

A. Bazin, Olivier Joubert, E. Pargon, 2009 .

The Cutting Edge of Plasma Etching

Olivier Joubert, Thorsten Lill, O. Joubert, 2008, Science.

Wall-dependent etching characteristics of organic antireflection coating in O2+halogen/hydrogen halide plasma

Songlin Xu, Thorsten Lill, Dragan Podlesnik, 2001 .

Linewidth roughness transfer measured by critical dimension atomic force microscopy during plasma patterning of polysilicon gate transistors

Olivier Joubert, Erwine Pargon, J. Foucher, 2008 .