Benjamen Michael Rathsack

Aerial image degradation effects due to imperfect sidewall profiles of EAPSM mask for 130-nm device node: 3D EMF simulations and wafer printing results

Won D. Kim, Benjamen Michael Rathsack, 2002, SPIE Advanced Lithography.

Fabrication of 28nm pitch Si fins with DSA lithography

Akiteru Ko, Ji Xu, Nihar Mohanty, 2013, Advanced Lithography.

Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition

Benjamen Michael Rathsack, B. Rathsack, 2001 .