Ken Miyagi

发表

Defect-aware process margin for chemo-epitaxial directed self-assembly lithography using simulation method based on self-consistent field theory

Katsuyoshi Kodera, Tomoharu Fujiwara, Tsukasa Azuma, 2014, Advanced Lithography.

Reactive ion etching challenges for half-pitch sub-10-nm line-and-space pattern fabrication using directed self-assembly lithography

Hitoshi Kubota, Katsuyoshi Kodera, Tsukasa Azuma, 2016, SPIE Advanced Lithography.

Post-polymerization modification of PS-b-PMMA for achieving directed self-assembly with sub-10nm feature size

Toshifumi Satoh, Kohei Yoshida, Akiyoshi Yamazaki, 2019, Advanced Lithography.

Sub-10nm lines and spaces patterning using grapho-epitaxial directed self-assembly of lamellar block copolymers

Hitoshi Kubota, Katsuyoshi Kodera, Tsukasa Azuma, 2016, SPIE Advanced Lithography.

A simulation study on bridge defects in lamellae-forming diblock copolymers

Katsuyoshi Kodera, Hironobu Sato, Tsukasa Azuma, 2018, Advanced Lithography.

Grapho-epitaxial sub-10nm line and space patterning using lamellar-forming Si-containing block copolymer

Hitoshi Kubota, Katsuyoshi Kodera, Tsukasa Azuma, 2016, SPIE Advanced Lithography.

Directed self-assembly lithography using coordinated line epitaxy (COOL) process

Hitoshi Kubota, Katsuyoshi Kodera, Tsukasa Azuma, 2015, Advanced Lithography.

Sub-10-nm patterning process using directed self-assembly with high χ block copolymers

Katsuyoshi Kodera, Tomoharu Fujiwara, Tsukasa Azuma, 2015 .

Block co-polymer approach for CD uniformity and placement error improvement in DSA hole grapho-epitaxy process

Katsumi Ohmori, Tsuyoshi Kurosawa, Tasuku Matsumiya, 2015, Advanced Lithography.

The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography.

R. Joseph Kline, Daniel F. Sunday, Thomas R. Albrecht, 2020, Chemistry of materials : a publication of the American Chemical Society.

A simulation study for defects in sub-15 nm line-space using directed self-assembly

Katsuyoshi Kodera, Tomoharu Fujiwara, Tsukasa Azuma, 2015 .

Directed self-assembly lithography for half-pitch sub-15 nm pattern fabrication process

Katsuyoshi Kodera, Tomoharu Fujiwara, Tsukasa Azuma, 2015 .

A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

Katsuyoshi Kodera, Tomoharu Fujiwara, Tsukasa Azuma, 2015 .