Toshiaki Ando

Defectivity and particle reduction for mask life extension, and imprint mask replication for high-volume semiconductor manufacturing

Mitsuru Hiura, Yukio Takabayashi, Takehiko Iwanaga, 2016, SPIE Advanced Lithography.

On the Running Noise of Toothed Belt Drive : 1st Report, Mechanism of Noise Generation

Aizoh Kubo, Toshio Aida, Susumu Sato, 1971 .

In-line surface preparation and resist plug removal on NIL templates

Uwe Dietze, Hiroyuki Ishida, Klaus Beschorner, 2016, Photomask Japan.