Larry S. Zurbrick

发表

Detection of 60° phase defects on alternating PSMs

Christopher A. Spence, David Emery, Larry S. Zurbrick, 1998, Photomask and Next Generation Lithography Mask Technology.

Phase-enhanced DUV inspection of alternating phase-shift reticles

Larry S. Zurbrick, Maciej W. Rudzinski, Long He, 2003, SPIE Photomask Technology.

Characterization of inspection sensitivity on advanced OPC reticles

Larry S. Zurbrick, Joseph A. Straub, Anthony Vacca, 1999, European Mask and Lithography Conference.

Reticle defect size calibration using low-voltage SEM and pattern recognition techniques for sub-200-nm defects

Jay Lee, Larry S. Zurbrick, Steve Khanna, 1999, Photomask Technology.

Reticle defect sizing of optical proximity correction defects using SEM imaging and image analysis techniques

Larry S. Zurbrick, Ellen R. Laird, Lantian Wang, 2000, Photomask Japan.

Fabrication and evaluation of a programmed transmission defect test mask

Larry S. Zurbrick, Paul DePesa, Ricardo A. Diola, 1994, Photomask Technology.

Inspection of alternating phase-shift masks through the use of phase contrast techniques

Larry S. Zurbrick, Maciej W. Rudzinski, Long He, 2003, European Mask and Lithography Conference.

Effects of transparent and transmission reduction reticle defects

Larry S. Zurbrick, James N. Wiley, Steven J. Schuda, 1994, Advanced Lithography.

AltPSM Inspection Capability and Printability of Quartz Defects

Larry S. Zurbrick, Jan Heumann, Michael Lang, 2002, Photomask Technology.

Results from a new die-to-database reticle inspection platform

Larry S. Zurbrick, Chris A. Mack, James N. Wiley, 2004, Photomask Japan.

Reticle programmed defect size measurement using low-voltage SEM and pattern recognition techniques

Jay Lee, Larry S. Zurbrick, Steve Khanna, 2000, European Mask and Lithography Conference.

Reticle OPC defect printability and detectability for 180-nm technology

Larry S. Zurbrick, Maciej W. Rudzinski, Mohan Ananth, 1999, Photomask and Next Generation Lithography Mask Technology.

Phase defect inspection of 130-nm node phase-shift masks using a simultaneous transmitted and reflected light pattern inspection algorithm

David Emery, Larry S. Zurbrick, Maciej W. Rudzinski, 2001, European Mask and Lithography Conference.

Improved method for measuring and assessing reticle pinhole defects for the 100-nm lithography node

Larry S. Zurbrick, Anthony Vacca, Darren Taylor, 2002, Photomask Japan.

High-resolution ultraviolet defect inspection of DAP (darkfield alternate phase) reticles

Lars W. Liebmann, Larry S. Zurbrick, Alfred K. K. Wong, 1999, Photomask Technology.

Chromeless phase lithography reticle defect inspection challenges and solutions

Larry S. Zurbrick, Anthony Vacca, Stephen Hsu, 2004, SPIE Photomask Technology.

Alternating Phase Shift Mask Inspection Through the Use of Phase Contrast Enhancement Techniques

Larry S. Zurbrick, Maciej W. Rudzinski, Long He, 2002, Photomask Technology.

Defect inspection of quartz-PSMs: taking a leap forward

Larry S. Zurbrick, Michael Lang, Jan Heumann, 2004, SPIE Advanced Lithography.

Improved method for measuring and assessing reticle pinhole defects

Larry S. Zurbrick, Anthony Vacca, Darren Taylor, 2002, SPIE Photomask Technology.

Defect inspection capability for advanced OPC photomasks

Larry S. Zurbrick, Joseph A. Straub, Anthony Vacca, 1998, Photomask Technology.

Meeting the challenge of advanced lithography reticle inspection

Larry S. Zurbrick, Stephen D. Kirkish, 1994, Photomask Technology.

New approaches to alternating phase-shift mask inspection

Larry S. Zurbrick, Maciej W. Rudzinski, Lantian Wang, 2002, SPIE Photomask Technology.

Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks

Larry S. Zurbrick, Richard Schenker, Edita Tejnil, 2000, Photomask Japan.

Measuring and assessing printability of reticle pinhole defects

Larry S. Zurbrick, Anthony Vacca, Darren Taylor, 2002, European Mask and Lithography Conference.

Detection of submicron phase defects on multiphase random logic reticles

Christopher A. Spence, David Emery, Larry S. Zurbrick, 1997, Photomask Technology.

Defect inspection and linewidth measurement of SCALPEL thin membrane masks using optical transmission

Larry S. Zurbrick, David L. Windt, Myrtle I. Blakey, 1998, Advanced Lithography.

High resolution ultraviolet defect inspection of DAP* reticles *darkfield alternate phase

Lars W. Liebmann, Larry S. Zurbrick, Maciej W. Rudzinski, 1999 .

Wafer printability simulation accuracy based on UV optical inspection images of reticle defects

Linard Karklin, Larry S. Zurbrick, Maciej W. Rudzinski, 1999, Advanced Lithography.

Reticle defects on optical proximity correction features

Larry S. Zurbrick, 1998, Photomask and Next Generation Lithography Mask Technology.

Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques

Larry S. Zurbrick, Maciej W. Rudzinski, Lantian Wang, 2002, Photomask Japan.

The detection of sub-micron phase defects on multi-phase random logic reticles

Christopher A. Spence, David Emery, Larry S. Zurbrick, 1998 .

An analysis of in-process pattern inspection benefit-to-cost relationship

Larry S. Zurbrick, 2004, Photomask Japan.