Todd R. Younkin

Material readiness for generation 2 directed self-assembly (DSA) < 24nm pitch

Eungnak Han, Todd R. Younkin, Manish Chandhok, 2015, Advanced Lithography.

A new technique for studying photo-acid generator chemistry and physics in polymer films using on-wafer ellipsometry and acid-sensitive dyes

Todd R. Younkin, Cheng-Tsung Lee, Jeanette M. Roberts, 2008, SPIE Advanced Lithography.

Evaluation of resist performance with EUV interference lithography for sub-22-nm patterning

Yasin Ekinci, Todd R. Younkin, Li Wang, 2012, Advanced Lithography.

Aryl sulfonates as neutral photoacid generators (PAGs) for EUV lithography

Hideaki Tsubaki, Todd R. Younkin, Tooru Tsuchihashi, 2009, Advanced Lithography.

Effect of PAG and matrix structure on PAG acid generation behavior under UV and high-energy radiation exposure

Mingxing Wang, Todd R. Younkin, Cheng-Tsung Lee, 2008, SPIE Advanced Lithography.