Manish Chandhok

发表

Material readiness for generation 2 directed self-assembly (DSA) < 24nm pitch

Eungnak Han, Todd R. Younkin, Manish Chandhok, 2015, Advanced Lithography.

EUVL alternating phase shift mask

Farhad Salmassi, Pei-Yang Yan, Guojing Zhang, 2011, Advanced Lithography.

EUV mask process development and integration

Yan Du, Pei-Yang Yan, Jeff Farnsworth, 2006, Photomask Japan.

Impact of line-width roughness on Intel's 65-nm process devices

Suman Datta, Manish Chandhok, Daniel Lionberger, 2007, SPIE Advanced Lithography.

Sources of line-width roughness for EUV resists

Bryan J. Rice, Manish Chandhok, Jeanette M. Roberts, 2004, SPIE Advanced Lithography.

Phase-shifting effect of thin-absorber EUV masks

Naoya Hayashi, Hiroyoshi Tanabe, Manish Chandhok, 2011, Photomask Technology.

Lithographic flare measurements of EUV full-field projection optics

Sang Hun Lee, Michael Goldstein, Donna J. O'Connell, 2003, SPIE Advanced Lithography.

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

Manish Chandhok, Todd R. Younkin, Terence Bacuita, 2011, Advanced Lithography.

Anisotropic EUV flare measured in the engineering test stand (ETS)

Sang Hun Lee, Michael Goldstein, Manish Chandhok, 2004, SPIE Advanced Lithography.

Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems

Bryan J. Rice, Michael Goldstein, Guojing Zhang, 2004, SPIE Advanced Lithography.

EUV resist patterning performance from the Intel microexposure tool (MET)

Bryan J. Rice, Manish Chandhok, Jeanette M. Roberts, 2005, SPIE Advanced Lithography.

EUV testing of multilayer mirrors: critical issues

Saša Bajt, Pei-Yang Yan, Manish Chandhok, 2006, SPIE Advanced Lithography.

EUV resist imaging below 50 nm using coherent spatial filtering techniques

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2004, SPIE Advanced Lithography.

Patterning capabilities of EUV resists

Jeffrey Bokor, Manish Chandhok, Sang Lee, 2004, SPIE Advanced Lithography.

EUVL dark-field exposure impact on CDs using thick and thin absorber masks

Guojing Zhang, Hiroyoshi Tanabe, Manish Chandhok, 2011, Advanced Lithography.

Addressing challenges in lithography using sub-millisecond post exposure bake of chemically amplified resists

Christopher K. Ober, Byungki Jung, Michael O. Thompson, 2011, Advanced Lithography.

Characterization of flare on Intel’s EUV MET

Sang Hun Lee, Manish Chandhok, Jeanette M. Roberts, 2005, SPIE Advanced Lithography.

Implementing flare compensation for EUV masks through localized mask CD resizing

Bryan J. Rice, Sang Hun Lee, Michael Goldstein, 2003, SPIE Advanced Lithography.

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Eric Hendrickx, Gian F. Lorusso, Jan Hermans, 2009, Advanced Lithography.

Intel's EUV resist development

Bryan J. Rice, Manish Chandhok, Jeanette M. Roberts, 2003, SPIE Advanced Lithography.

EUV lithography program at IMEC

Gian Francesco Lorusso, Frieda Van Roey, Insung Kim, 2007, SPIE Advanced Lithography.

One small step: world's first integrated EUVL process line

Bryan J. Rice, Guojing Zhang, Manish Chandhok, 2005, SPIE Advanced Lithography.

EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs

Manish Chandhok, Todd R. Younkin, E. Steve Putna, 2009, Advanced Lithography.

Techniques for directly measuring the absorbance of photoresists at EUV wavelengths

Eric M. Gullikson, Robert L. Brainard, Manish Chandhok, 2004, SPIE Advanced Lithography.

Characterization of the photoacid diffusion length

Wen-li Wu, Vivek M. Prabhu, Eric K. Lin, 2009, Advanced Lithography.

Effects of processing parameters on line-width roughness

Bryan J. Rice, Manish Chandhok, Heidi B. Cao, 2003, SPIE Advanced Lithography.

Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist

Wen-li Wu, John T. Woodward, Vivek M. Prabhu, 2007, SPIE Advanced Lithography.

Determination of the flare specification and methods to meet the CD control requirements for the 32-nm node using EUVL

Bryan J. Rice, Michael Goldstein, Manish Chandhok, 2004, SPIE Advanced Lithography.

Demonstration of full-field patterning of 32 nm test chips using EUVL

James S. Clarke, Guojing Zhang, Manish Chandhok, 2009, Advanced Lithography.

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

Manish Chandhok, Todd R. Younkin, E. Steve Putna, 2010, Advanced Lithography.

Sub-millisecond post exposure bake of chemically amplified resists by CO2 laser heat treatment

Christopher K. Ober, Byungki Jung, Michael O. Thompson, 2010, Advanced Lithography.

Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors

Ming Fang, Saša Bajt, Manish Chandhok, 2007, SPIE Advanced Lithography.

Process window study with various partial coherences on EUV MET (micro exposure tool) optics

Sang Hun Lee, Manish Chandhok, Courtney Brewer, 2006, SPIE Advanced Lithography.

Mo/Si multilayers with enhanced TiO2- and RuO2-capping layers

Torsten Feigl, Ming Fang, Manish Chandhok, 2008, SPIE Advanced Lithography.

LWR reduction and flow of chemically amplified resist patterns during sub-millisecond heating

Christopher K. Ober, Byungki Jung, Michael O. Thompson, 2011, Advanced Lithography.

Flare and lens aberration requirements for EUV lithographic tools

Manish Chandhok, Yashesh Shroff, Sang Hun Lee, 2005, SPIE Advanced Lithography.

Kinetic rates of thermal transformations and diffusion in polymer systems measured during sub-millisecond laser-induced heating.

Byungki Jung, Michael O. Thompson, Manish Chandhok, 2012, ACS nano.

Exposing extreme ultraviolet lithography at Intel

Bryan J. Rice, Guojing Zhang, Manish Chandhok, 2006 .

Lithographic flare measurements of Intel’s microexposure tool optics

Bryan J. Rice, Manish Chandhok, Jeanette M. Roberts, 2006 .

EUV Resist Testing Status and Post Lithography LWR Reduction

Manish Chandhok, Todd R. Younkin, E. Steve Putna, 2011 .

EUVL System Patterning Performance

Patrick P. Naulleau, Manish Chandhok, J. E. Bjorkholm, 2008 .

Submillisecond post-exposure bake of chemically amplified resists by CO2 laser spike annealing

Byungki Jung, Michael O. Thompson, Manish Chandhok, 2009 .

Improvement in linewidth roughness by postprocessing

Manish Chandhok, Wang Yueh, Todd R. Younkin, 2008 .

Absorbance measurement of polymers at extreme ultraviolet wavelength: Correlation between experimental and theoretical calculations

Eric M. Gullikson, Manish Chandhok, Young-Je Kwark, 2006 .