Florian Gstrein

Material readiness for generation 2 directed self-assembly (DSA) < 24nm pitch

Eungnak Han, Todd R. Younkin, Manish Chandhok, 2015, Advanced Lithography.

Novel Patterning Approaches for Continued Device Scaling

Florian Gstrein, 2015 .

Dry development rinse process for ultimate resolution improvement via pattern collapse mitigation

Geert Vandenberghe, Danilo De Simone, Arjun Singh, 2015, Advanced Lithography.

Investigation of novel inorganic resist materials for EUV lithography

Marie Krysak, Florian Gstrein, James M. Blackwell, 2014, Advanced Lithography.

Patterning challenges in the fabrication of 12 nm half-pitch dual damascene copper ultra low-k interconnects

Richard Schenker, Florian Gstrein, Alan Myers, 2014, Advanced Lithography.

Scaling opportunities with next-generation, multi-pitch directed self assembly

Florian Gstrein, 2021 .

High-frequency electrical properties of individual and bundled carbon nanotubes

John J. Plombon, Florian Gstrein, Valery M. Dubin, 2007 .