Hiromasa Hoko

发表

Thermal response of EUVL mask substrate during dry etching process

Akira Chiba, Masashi Takahashi, Masaaki Ito, 2001, Photomask Japan.

Fabrication of Mo/Si multilayer for EUVL reticle blank using ion beam sputtering

Masashi Takahashi, Shinji Okazaki, Eiichi Hoshino, 2002, SPIE Advanced Lithography.

Smooth low-stress sputtered tantalum and tantalum alloy films for the absorber material of reflective-type EUVL

Akira Chiba, Masashi Takahashi, Shinji Okazaki, 2000, Advanced Lithography.

Characteristics of the Ru buffer layer for EUVL mask patterning

Akira Chiba, Masashi Takahashi, Masaaki Ito, 2001, SPIE Advanced Lithography.

Process scheme for removing buffer layer on multilayer for EUVL mask

Akira Chiba, Masashi Takahashi, Masaaki Ito, 2000, Photomask Japan.

Pattern printability for reflectance degradation of Mo/Si mask blanks in EUV lithography

Iwao Nishiyama, Akira Chiba, Masashi Takahashi, 2002, Photomask Japan.

Removal process for buffer layer on multilayer of EUVL mask

Akira Chiba, Masashi Takahashi, Masaaki Ito, 2001, European Mask and Lithography Conference.

Simulation studies of roughness-smoothing effect of molybdenum/silicon multilayer coating based on resputtering model

Masaaki Ito, Shinji Okazaki, Eiichi Hoshino, 2002, SPIE Advanced Lithography.

Surface preparation of EUVL mask substrate for multilayer coating by supersonic hydrocleaning technique

Akira Chiba, Masashi Takahashi, Shinji Okazaki, 2000, Photomask Japan.

Tantalum nitride films for the absorber material of refractive-type EUVL mask

Akira Chiba, Masashi Takahashi, Shinji Okazaki, 2001, SPIE Advanced Lithography.

Dry etching of Ta absorber for EUVL masks

Akira Chiba, Masashi Takahashi, Masaaki Ito, 2001, SPIE Photomask Technology.

Damage control during dry etching of EUV mask: I. Control of surface roughness

Masashi Takahashi, Shinji Okazaki, Eiichi Hoshino, 1999, Photomask Technology.

Characteristics of Ru as a buffer layer or an etch stopper for EUVL mask patterning

Masaaki Ito, Shinji Okazaki, Hiromasa Yamanashi, 2002 .

Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask

Masaaki Ito, Hiromasa Yamanashi, Hiromasa Hoko, 2001 .

Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer

Man-Hyoung Ryoo, Masaaki Ito, Hiromasa Yamanashi, 2001 .

Transmission Electron Microscopy Observation and Simulation Analysis of Defect-Smoothing Effect of Molybdenum/Silicon Multilayer Coating for Extreme Ultraviolet Lithography Masks

Masaaki Ito, Shinji Okazaki, Hiromasa Yamanashi, 2002 .