Jörg Zimmermann

Understanding illumination effects for control of optical proximity effects (OPE)

Yu Cao, Robert John Socha, Peng Liu, 2008, SPIE Advanced Lithography.

Performance and characteristics of the NXE:3400 optical system enabling sub-10nm node lithography (Conference Presentation)

Tilmann Heil, Peter Kürz, Erik Roelof Loopstra, 2017 .

Polymorphe Typinferenz für Prolog

Jörg Zimmermann, 1995, WLP.

EUV resolution enhancement techniques (RETs) for k1 0.4 and below

Stephen Hsu, Jianjun Jia, Keith Gronlund, 2015, Advanced Lithography.