Peter Leunissen

Printability study with polarisation capable AIMSTM fab 193i to study polarisation effects

Lieve Van Look, Vicky Philipsen, Eric Poortinga, 2006, SPIE Advanced Lithography.

Low temperature through-Si via fabrication using electroless deposition

Fumihiro Inoue, Hiroshi Miyake, Peter Leunissen, 2012, 2011 IEEE International 3D Systems Integration Conference (3DIC), 2011 IEEE International.

Spectral analysis of line width roughness and its application to immersion lithography

Gian Francesco Lorusso, Peter Leunissen, Nadia Vandenbroeck, 2006 .