Jan Paul

FeFET: A versatile CMOS compatible device with game-changing potential

Sven Beyer, Martin Trentzsch, Thomas Mikolajick, 2020, 2020 IEEE International Memory Workshop (IMW).

High Resolution Patterning for Sub 30 nm Technology Nodes Using a Ceramic Based Dual Hard Mask

Christoph Hohle, Jan Paul, V. Beyer, 2013 .

Correlation between the macroscopic ferroelectric material properties of Si:HfO2 and the statistics of 28 nm FeFET memory arrays

S. Henker, Stefan Slesazeck, Thomas Mikolajick, 2016 .

Advanced Dual Hard Mask Patterning Scheme to Enable High Resolution Lithography for sub 30 nm Technology Nodes

Christoph Hohle, Jan Paul, V. Beyer, 2012 .

Invited) Integration Challenges of Ferroelectric Hafnium Oxide Based Embedded Memory

Stefan Slesazeck, Halid Mulaosmanovic, Thomas Mikolajick, 2015 .

Charge-Trapping Phenomena in HfO2-Based FeFET-Type Nonvolatile Memories

Thomas Mikolajick, Jan Paul, Milan Pesic, 2016, IEEE Transactions on Electron Devices.

Introduction of zirconium oxide in a hardmask concept for highly selective patterning of scaled high aspect ratio trenches in silicon

Christoph Hohle, Jan Paul, M. Czernohorsky, 2012 .