Ha Soo Hwang

Orthogonal lithography for organic electronics

Christopher K. Ober, George G. Malliaras, Jin-Kyun Lee, 2010, Advanced Lithography.

Inverse Opal Nanocrystal Superlattice Films.

Tobias Hanrath, Ha Soo Hwang, K. Johnston, 2004, Nano letters.

Acid-diffusion behaviour in organic thin films and its effect on patterning

Evan L. Schwartz, George G. Malliaras, Christopher K. Ober, 2009 .

Dry photolithographic patterning process for organic electronic devices using supercritical carbon dioxide as a solvent

Xavier Andre, George G. Malliaras, Christopher K. Ober, 2008 .

Acid-sensitive semiperfluoroalkyl resorcinarene: an imaging material for organic electronics.

John A. DeFranco, Ha Soo Hwang, Hon Hang Fong, 2008, Journal of the American Chemical Society.