Meng H. Lee

Ion beam etching of new absorber materials for sub-5nm EUV masks

Katrina Rook, Vincent Ip, Sandeep Kohli, 2019, Advanced Lithography.

Ion beam processing for critical EUV photomask process steps: mask blank deposition and photomask absorber etch

Katrina Rook, Vincent Ip, Sandeep Kohli, 2018, Photomask Technology.